Hafnium tetrachloride | HFCL4 Powder | Cas 13499-05-3 | officinas

Hafnium tetrachloride | HFCL4 Powder | Cas 13499-05-3 | Factory Price Featured Image

Short description:

Hafnium tetrachloride habet momenti applications sicut praecursor Hafnium cadmiae, Catalyst ad organicum synthesis, nuclei applications, et tenuis film depositione, excitatur eius versatility et momenti in variis technicae agris.

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Product Detail

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Product Description

Brevis

Product Name: Hafnium Tetrachloride
CAS non.: 13499-05-3
Formula compositis: HFCL4
Molecular pondus: 320,3
Specie Alba pulveris

Specificatio

Item	Specificatio
Species	Alba pulveris
HFCL4 + zrcl4	≥99.9%
Zr	≤200ppm
Fe	≤40ppm
Ti	≤20ppm
Si	≤40ppm
Mg	≤20ppm
Cr	≤20ppm
Ni	≤25ppm
U	≤5ppm
Al	≤60ppm

Applicatio

Hafnium dioxide precursor: Hafnium tetrachloride est praesertim usus est precursor ad producendum Hafnium dioxide (HFO2), a materia cum excellentrice Dielectric Properties. HFO2 late in altum-k dielectric applications ad transistores et capacitors in semiconductor industria. HFCL4 est essentiale in fabricantibus provectus electronic cogitationes propter suam facultatem formare tenuis films de Hafnium dioxide.
Organicum synthesis Catalyst: Hafnium tetrachloride potest esse ut catalyst pro variis organicum synthesis reactiones, praesertim olefin polymerization. Et Lewis Acidum proprietatibus auxilium ad formare activae intermedia, ita improving efficientiam eget profectae. Hoc application est valuable in productio polymers et alia organica componit in eget industria.
Nuclei applicationem: Ob altum neutron effusio crucis sectionem, Hafnium tetrachloride late in nuclei applications, praesertim in potestate virgas nuclei reactors. Hafnium potest efficaciter absorbet neutrons, ita idoneam materiam pro regulantes fission processus, quod adjuvat ad amplio salus et efficientiam nuclei potentiae generationem.
Tenues film deposition: Hafnium tetrachloride est in eget vapor depositione (cvd) processibus ad formare tenuis films de Hafnium-secundum materiae. Hi films sunt essentialis in variis applications, comprehendo microelectronics, optices et tutela coatings. Et facultatem ad depositum uniformis, summus qualis films facit HFCL4 valuable in provectus vestibulum processus.