Scandium fluoride | High puritate 99.99% | SCF3 | CAS 13709-47-2

Short description:

Scandium fluoride est a key rudis materia quia faciens scandium metallum (SC) et quod est momenti additive ad improving proprietatibus Alloys ut aluminium-scandium mloy. Scandium metallum est 3D transitional metallum, quod est optimum habet rationem rara terra elementa et transitus elementa. Est clavis rudis materia ad praeparationem electrica lux fons materiae, laser materiae, al-SC Alloy materiae et superconducting materiae. Is est lata application spes in summus tech agros ut laser, superconductivity, aviation, nuclei potentia, nuclei industria et optoelectronics.

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Product Detail

Product Tags

BREVIS

Formula: SCF3

CAS non.: 13709-47-2

Molecular pondus 101,95

Density: 3.84 G / CM3

Melting Point: MDLII ° F

Specie Alba pulveris aut crystallinum

Solubility: insolubilis aqua et fortis mineralibus acida

Stabilitas: Hygroscopic

Multilingual, Scandiumfluorid, Fluorure de Scandium, Fluoruro del Scandium

Products available

Product Name	Scandium fluoride
Sc2o3 / treo (min).	99,999	99.99	99.9
Treo (% min).	65	65	65
Damnum in ignitionem (% max.)	1	1	1
Rara terra impudicitiis	PPM max.	PPM max.	% Max.
La2o3 / Treo	2	10	0.005
Ceo2 / Treo	1	10	0.005
Pr6o11 / Treo	1	10	0.005
ND2O3 / Treo	1	10	0.005
Sm2o3 / Treo	1	10	0.005
Eu2o3 / Treo	1	10	0.005
GD2O3 / Treo	1	10	0.005
TB4O7 / Treo	1	10	0.005
Dy2o3 / Treo	1	10	0.005
Ho2o3 / Treo	1	10	0.005
Er ossis / treo	3	10	0.005
TM2O3 / Treo	3	10	0.005
Yb2o3 / Treo	3	10	0,05
Lu2o3 / Treo	3	10	0.005
Y2o3 / treo	5	10	0.01 0.01
Non-rara terra impudicitiis	PPM max.	PPM max.	% Max.
Fe2o3	5	20	0.005
Sio2	10	C	0,02
CAO	50	80	0.01 0.01
CUO	5
Nio	3
PBO	5
Zro2	50
Tio2	10

Applicatio

Scandium fluoride est maxime usus ad praeparationem scandium metallum et additives ad amplio proprietatibus Alloys

Scandium fluoride est applicari in optical coating, Catalyst, electronic Ceramics et laser industria. Est etiam usus annuatim in faciens summus intensionem missionem lampades. A excelsum liquescens albus solidum in altum temperatus systems (ad suum resistentiam ad calorem et scelerisque inpulsa), electronic Ceramics et speculum compositionem. Apta Vacuum Depositionem Applications

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